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1 article(s) from Gleixner, Julia

Mapping of plasmonic resonances in nanotriangles

Simon Dickreuter,
Julia Gleixner,
Andreas Kolloch,
Johannes Boneberg,
Elke Scheer and
Paul Leiderer

Beilstein J. Nanotechnol. 2013, 4, 588–602, doi:10.3762/bjnano.4.66

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Figure 1: Optical set-up. The sample is mounted on an x–y micrometer stage and can be moved reversibly below ...

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Figure 2: (a) Laser profile at the sample position taken with a CCD camera. Next to the central maximum the f...

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Figure 3: Scanning electron micrographs of different types of triangles used in the course of this work. The ...

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Figure 4: AFM image of a colloid lithography triangle. (a) Top view; (b) 3D image.

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Figure 5: Upper left: Fluence distribution along the laser spot radius as described in the Experimental secti...

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Figure 6: (a) Calculated field intensity enhancement, (b) dissipation, and (c) field distribution for a nanot...

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Figure 7: (a) AFM image of a Si surface with ablation holes, generated by irradiation of colloid lithography ...

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Figure 8: Hole depth (as determined from profiles such as in Figure 7b, measured with respect to the height of the fla...

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Figure 9: AFM image and height profile of an ablation hole generated by far-field ablation of bare Si (same w...

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Figure 10: Depth of holes in Si, generated by far-field ablation, as a function of the peak fluence.

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Figure 11: SEM micrographs of two different types of nanotriangles prepared by electron beam lithography, and ...

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Figure 12: FDTD calculations for the structures presented in Figure 11. The field intensity enhancement was extracted i...

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Figure 13: (a) SEM micrograph and (b) calculated field distribution for the center region of a bow-tie antenna...

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Figure 14: Evolution of laser-molten gold triangles (thickness: 40 nm, side length: 530 nm, prepared by colloi...

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Figure 15: (a) SEM micrograph of colloid lithography nanotriangles irradiated with a 300 ps laser pulse (wavel...

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Figure 16: Molten volume at the triangle tips vs local laser fluence.

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Figure 17: SEM micrographs of a 40 nm Au film on Si, after exposition to a 300 ps laser pulse at 800 nm wavele...

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Published 30 Sep 2013

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